Testing of optical components for microlithography at 193-nm and 157-nm

Klaus R. Mann; Oliver Apel; G. Eckert; Christian Goerling; Uwe Leinhos; Bernd Schaefer

doi:10.1117/12.435671

14 September 2001 Testing of optical components for microlithography at 193-nm and 157-nm

Klaus R. Mann, Oliver Apel, G. Eckert, Christian Goerling, Uwe Leinhos, Bernd Schaefer

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435671
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

Absorption loss in UV optics during 193nm and 157nm irradiation is investigated by employing a high-resolution calorimetric technique which allows determining both single and two-photon absorptance at low energy densities. UV calorimetry is also employed to investigate laser induced aging phenomena, e.g. color center formation in fused silica. A separation of transient and cumulative effects can be achieved, giving insight into the loss mechanisms. A strong wavelength dependence of the DUV and VUV absorption characteristics in CaF₂ substrates is observed. In addition, Hartmann-Shack wavefront measurements are presented, which allow on-line monitoring of laser-induced compaction in fused silica.

Citation Download Citation

Klaus R. Mann, Oliver Apel, G. Eckert, Christian Goerling, Uwe Leinhos, and Bernd Schaefer "Testing of optical components for microlithography at 193-nm and 157-nm", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435671

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