Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Graham G. Arthur; Brian Martin

doi:10.1117/12.425208

26 April 2001 Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA

Graham G. Arthur, Brian Martin

Author Affiliations +

Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425208
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

A development rate model for lithography simulation of extremely thick resist films is presented. Methods used in the extraction of lithographic modeling parameters for simulation packages such as PROLITH/2 are examined. The results account for hitherto little-considered aspects of the development process which, when implemented in the simulations, give good agreement with practical result. Effects examined include the variation in photoresist dissolution properties as a function of depth into the resist film and diffusion of the developer/resist in the spaces surrounding features. These refinements, which are particularly useful for MEMS and lithography, galvanoformung und abformung (LIGA) applications, can also be applied to conventional lithography in situations where the development models of commercially available software are unable to provide accurate results. The technique also provides a method for quantifying the effectiveness of mechanical, megasonic or ultrasonic during development.

Citation Download Citation

Graham G. Arthur and Brian Martin "Enhancing the development rate model in optical lithography simulation of ultrathick resist films for applications such as MEMS and LIGA", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); https://doi.org/10.1117/12.425208

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