Tools and processes for MEMS and nanotechnology

Philip D. Prewett; Syed Ejazu Huq; M. C. L. Ward

doi:10.1117/12.425207

26 April 2001 Tools and processes for MEMS and nanotechnology

Philip D. Prewett, Syed Ejazu Huq, M. C. L. Ward

Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425207
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

Research into MEMS and Nanotechnology covers the range of feature dimensions form sub-millimeter to nanometer scales. It relies upon tools and processes for lithography and pattern transfer drawn largely but not exclusively from the silicon semiconductor industry. Optical lithography systems, particle beam nanowriter tools and x-ray sources may be regarded as the 'machine tools' for MEMS and Nanotechnology, each with their unique advantages and limitations. They are being exploited for R and D applications ranging from customized MEMS to vacuum microelectronics and novel nanotools such as electron micro columns and multiple tip scanning probe systems.

Citation Download Citation

Philip D. Prewett, Syed Ejazu Huq, and M. C. L. Ward "Tools and processes for MEMS and nanotechnology", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); https://doi.org/10.1117/12.425207

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