Development of refined cleaning technique focusing on an ecological viewpoint

Koji Tange; Yoshikazu Nagamura; Kunihiro Hosono; Yuki Oomasa; Koichi Kido; Atsushi Hayashi; Yasutaka Kikuchi; Ichiro Imagawa; Yuichi Matsuzawa; Hozumi Usui

doi:10.1117/12.438375

5 September 2001 Development of refined cleaning technique focusing on an ecological viewpoint

Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, Hozumi Usui

Author Affiliations +

Proceedings Volume 4409, Photomask and Next-Generation Lithography Mask Technology VIII; (2001) https://doi.org/10.1117/12.438375
Event: Photomask and Next Generation Lithography Mask Technology VIII, 2001, Kanagawa, Japan

Abstract

In this paper, we focused on the refined cleaning process with minium use of chemicals. We developed a cleaning tools and process using high-concentration ozonic water generated by the high-efficiency ozonizing apparatus (OW00345, Mitsubishi Electric Corp. Industrial Systems), as chemicals substitution. To optimize a cleaning process, we have evaluated the removal and decomposition efficiency of organic compounds on the mask surface, the optical degradation of Cr and Siliside materials and so on.

Citation Download Citation

Koji Tange, Yoshikazu Nagamura, Kunihiro Hosono, Yuki Oomasa, Koichi Kido, Atsushi Hayashi, Yasutaka Kikuchi, Ichiro Imagawa, Yuichi Matsuzawa, and Hozumi Usui "Development of refined cleaning technique focusing on an ecological viewpoint", Proc. SPIE 4409, Photomask and Next-Generation Lithography Mask Technology VIII, (5 September 2001); https://doi.org/10.1117/12.438375

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