Paper
27 March 2002 Fabrication of aperiodic gratings on silicon-on-insulator (SOI) rib waveguides using e-beam lithography
Venkat Raghavan Subramanian, Ray G. DeCorby, James N. McMullin, Chris J. Haugen, Miroslav Belov
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Abstract
A technique for fabricating aperiodic Bragg gratings in rib waveguides on Silicon-On-Insulator (SOI) is presented. The technique allows flexibility in defining various characteristics of aperiodic gratings so that a full range of optical grating filters can be realized. The fabrication process comprises optical and electron-beam (e-beam) lithography followed by a liftoff and a single Reactive Ion Etch (RIE) to simultaneously produce the waveguide and the embedded grating structure.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Venkat Raghavan Subramanian, Ray G. DeCorby, James N. McMullin, Chris J. Haugen, and Miroslav Belov "Fabrication of aperiodic gratings on silicon-on-insulator (SOI) rib waveguides using e-beam lithography", Proc. SPIE 4654, Silicon-based and Hybrid Optoelectronics IV, (27 March 2002); https://doi.org/10.1117/12.463856
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Cited by 3 scholarly publications.
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KEYWORDS
Waveguides

Silicon

Fiber Bragg gratings

Electron beam lithography

Etching

Scanning electron microscopy

Optical filters

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