Implementing fully automatic macro defect detection and classification system in high-production semiconductor fab

Lloyd Lee; Michael Pham; David Pham; Manyam Khaja; Kathleen A. Hennessey; Juanita Miller

doi:10.1117/12.473524

16 July 2002 Implementing fully automatic macro defect detection and classification system in high-production semiconductor fab

Lloyd Lee, Michael Pham, David Pham, Manyam Khaja, Kathleen A. Hennessey, Juanita Miller

Author Affiliations +

Proceedings Volume 4689, Metrology, Inspection, and Process Control for Microlithography XVI; (2002) https://doi.org/10.1117/12.473524
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The process of shifting from human after develop inspection (ADI) to automatic detection, classification and review of macro defects in the photolithography process is overviewed. The experiences and improvements from integration of automated macro defect detection and classification systems in a full volume, state-of-the-art production fab is described.

Citation Download Citation

Lloyd Lee, Michael Pham, David Pham, Manyam Khaja, Kathleen A. Hennessey, and Juanita Miller "Implementing fully automatic macro defect detection and classification system in high-production semiconductor fab", Proc. SPIE 4689, Metrology, Inspection, and Process Control for Microlithography XVI, (16 July 2002); https://doi.org/10.1117/12.473524

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