157-nm single-layer resists based on advanced fluorinated polymers

Naomi Shida; Hiroyuki Watanabe; Tamio Yamazaki; Seiichi Ishikawa; Minoru Toriumi; Toshiro Itani

doi:10.1117/12.474247

24 July 2002 157-nm single-layer resists based on advanced fluorinated polymers

Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Minoru Toriumi, Toshiro Itani

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474247
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Various polymer structures for 157-nm lithography have been vigorously developed for post 193-nm lithography. Polymers with a fluorinated main chain can improve high transparency at the 157-nm wavelength; conversely, norbornene copolymers with fluoride pendant groups do not achieve so high transparency at the 157-nm wavelength. We have developed a novel 157-nm chemically amplified resist. It is composed of a fluorinated monocyclic main-chain polymer, which shows high transparency and can be used for single layer resists. This new resist is referred to as a Small Absorbance Fluorine contAining ResIst (SAFARI). The SAFARI resist exhibited high-resolution patterns of 65-nm line and space patterns using a 0.85 NA microstepper, good sensitivity of 4 mJ/cm², and high transparency when applied to 250-nm film thickness.

Citation Download Citation

Naomi Shida, Hiroyuki Watanabe, Tamio Yamazaki, Seiichi Ishikawa, Minoru Toriumi, and Toshiro Itani "157-nm single-layer resists based on advanced fluorinated polymers", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474247

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