Effect of delay time on the performance of DUV resist for various pattern size and shape

Dong-Seok Kim; Jong O Park; Byung-Ho Nam; Hoon Huh

doi:10.1117/12.474273

24 July 2002 Effect of delay time on the performance of DUV resist for various pattern size and shape

Dong-Seok Kim, Jong O Park, Byung-Ho Nam, Hoon Huh

Proceedings Volume 4690, Advances in Resist Technology and Processing XIX; (2002) https://doi.org/10.1117/12.474273
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Airborne amine control history for DUV lithography dates back to early 1990's. Environmentally stable resist coupled with air filter system was successfully adopted to cope with the issue. Today's trend toward extending KrF lithography lifetime further, however, demands a hard-to-achieve goal in CD control budget. Small CD change which was acceptable several years ago can no longer be tolerated in current critical technology node. We came to know that CD changes in a different manner for delay time depending on the amine concentration, pattern size, shape, and density. At very low amine concentration, delay time dependency is strongly governed by the chemical composition of the resist material. Relaxation of such dependency could be fulfilled by tuning resist bake condition.

Citation Download Citation

Dong-Seok Kim, Jong O Park, Byung-Ho Nam, and Hoon Huh "Effect of delay time on the performance of DUV resist for various pattern size and shape", Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, (24 July 2002); https://doi.org/10.1117/12.474273

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