Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

Toshiya Kotani; Sachiko Kobayashi; Hirotaka Ichikawa; Satoshi Tanaka; Susumu Watanabe; Soichi Inoue

doi:10.1117/12.474546

30 July 2002 Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module

Toshiya Kotani, Sachiko Kobayashi, Hirotaka Ichikawa, Satoshi Tanaka, Susumu Watanabe, Soichi Inoue

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474546
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

Advanced hybrid optical proximity correction (OPC) system with OPC segment library and a model-based correction module has been found to be much promising for reducing the mask data processing time. Recycling the OPC segment library made of previous products for next derivative products with common design rule could reduce the OPC process time down to 11% at the sixth Application Specific Integrated Circuit product for the conventional hybrid OPC scheme. Then, under the circumstances that the block-level layout verification tool with the hybrid OPC tool and the lithography simulator is utilized by designers for avoiding the lithographic dangers in the early stage of design, the most effective library can be generated in this layout verification flow and used for the correction of the completed layout. Due to this scheme, the OPC process time could be decreased to 11-16% for 256-Mbit Dynamic Random Access Memory gate and metal layer.

Citation Download Citation

Toshiya Kotani, Sachiko Kobayashi, Hirotaka Ichikawa, Satoshi Tanaka, Susumu Watanabe, and Soichi Inoue "Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474546

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