Algorithmic implementations of domain decomposition methods for the diffraction simulation of advanced photomasks

Konstantinos Adam; Andrew R. Neureuther

doi:10.1117/12.474483

30 July 2002 Algorithmic implementations of domain decomposition methods for the diffraction simulation of advanced photomasks

Konstantinos Adam, Andrew R. Neureuther

Author Affiliations +

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474483
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

The domain decomposition method developed in [1] is examined in more detail. This method enables rapid computer simulation of advanced photomask (alt. PSM, masks with OPC) scattering and transmission properties. Compared to 3D computer simulation, speed-up factors of approximately 400, and up to approximately 200,000 when using the look-up table approach, are possible. Combined with the spatial frequency properties of projection printing systems, it facilitates accurate computer simulation of the projected image (normalized mean square error of a typical image is only a fraction of 1%). Some esoteric accuracy issues of the method are addressed and the way to handle arbitrary, Manhattan-type mask layouts is presented. The method is shown to be valid for off-axis incidence. The cross-talk model developed in [1] is used in 3D mask simulations (2D layouts).

Citation Download Citation

Konstantinos Adam and Andrew R. Neureuther "Algorithmic implementations of domain decomposition methods for the diffraction simulation of advanced photomasks", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474483

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