Evaluation of OPC mask printing with a raster scan pattern generator

Thomas H. Newman; Jan M. Chabala; B.J. Marleau; Frederick Raymond III; Olivier Toublan; Mark A. Gesley; Frank E. Abboud

doi:10.1117/12.474514

30 July 2002 Evaluation of OPC mask printing with a raster scan pattern generator

Thomas H. Newman, Jan M. Chabala, B.J. Marleau, Frederick Raymond III, Olivier Toublan, Mark A. Gesley, Frank E. Abboud

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474514
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

MEBES^R 50 kV mask pattern generators use Raster Graybeam^TM writing, providing an effective grid that is 32X finer than the print grid. The electron beam size and print pixel size are variable between 60 nm and 120 nm, allowing a tradeoff between resolution and write time. Raster scan printing optimizes throughput by transferring precisely the amount of data to the mask that is consistent with the chosen resolution. As with other raster output devices, mask write times are not affected by pattern complexity. This paper examines the theoretical performance of Raster Graybeam for model-based optical proximity correction (OPC) patterns and provides examples of mask patterning performance. A simulation tool is used to model the MEBES eXara^TM system writing strategy, which uses four writing passes, interstitial print grids, offset scans, and eight dose levels per pass. It is found that Raster Graybeam produces aerial image quality equivalent to the convolution of the input pattern data with a Gaussian point spread function. Resolution of 90 nm is achieved for equal lines and spaces, supporting subresolution assist features. Angled features are a particular strength of raster scan patterning, with feature quality and write time that are independent of feature orientation.

Citation Download Citation

Thomas H. Newman, Jan M. Chabala, B.J. Marleau, Frederick Raymond III, Olivier Toublan, Mark A. Gesley, and Frank E. Abboud "Evaluation of OPC mask printing with a raster scan pattern generator", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474514

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