Paper
19 April 2002 Silicon as material for mechanical wristwatches
Andre Perret, Arno Hoogerwerf, Philippe Niedermann, Xiao-Ming Tang, Sylvain Jeanneret, Pierre-Andre Clerc, Nico F. de Rooij, Pierre Gygax
Author Affiliations +
Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462866
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France
Abstract
Silicon has been widely used as the material of choice for the fabrication of MEMS I MST devices. The compatibility of MEMS manufacturing equipment with standard IC equipment presents one ofthe main reasons for this choice. However, over the past years, we have seen new equipment dedicated to MEMS fabrication enter the market place. One such example is the Deep Reactive Ion Etcher, which is capable of vertically etching silicon at a rate of several microns per minute. This type of equipment, now available from several vendors, has revolutionized the MEMS fabrication capabilities and has opened the door to a whole new family of MEMS devices [1].
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre Perret, Arno Hoogerwerf, Philippe Niedermann, Xiao-Ming Tang, Sylvain Jeanneret, Pierre-Andre Clerc, Nico F. de Rooij, and Pierre Gygax "Silicon as material for mechanical wristwatches", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); https://doi.org/10.1117/12.462866
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Cited by 3 scholarly publications.
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KEYWORDS
Silicon

Microelectromechanical systems

Etching

Oxides

Semiconducting wafers

Deep reactive ion etching

Magnetism

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