Properties of SiO2 buffer layer for silica waveguide by flame hydrolysis deposition

Letian Zhang; Yuanda Wu; Wenfa Xie; Hua Xing; Aiwu Li; Wei Zheng; Yushu Zhang

doi:10.1117/12.481034

29 August 2002 Properties of SiO₂ buffer layer for silica waveguide by flame hydrolysis deposition

Letian Zhang, Yuanda Wu, Wenfa Xie, Hua Xing, Aiwu Li, Wei Zheng, Yushu Zhang

Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.481034
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China

Abstract

Si0₂ films were fabricated on Si substrates by flame hydrolysis deposition (FHD) as buffer layer of waveguides. The optical and surface properties of the films were characterized using scanning electron microanalyzer (SEM), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and variable angle spectroscopic ellipsometry (VASE). From a series of analyses, we demonstrated the excellent silica films fabricated. It proves that Si0₂ films prepared by flame hydrolysis deposition are entirely able to be applied in planar optical waveguides.

Citation Download Citation

Letian Zhang, Yuanda Wu, Wenfa Xie, Hua Xing, Aiwu Li, Wei Zheng, and Yushu Zhang "Properties of SiO₂ buffer layer for silica waveguide by flame hydrolysis deposition", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.481034

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