Overview of grey-scale photolithography for micro-optical elements fabrication

Zheng Cui; Jinglei Du; Yongkang Guo

doi:10.1117/12.477831

17 January 2003 Overview of grey-scale photolithography for micro-optical elements fabrication

Zheng Cui, Jinglei Du, Yongkang Guo

Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477831
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

The advance in microlithography has greatly helped the development of microoptical elements. Large array of microlenses can now be fabricated in the same fashion as manufacturing of integrated circuits. Because most of the microoptical elements require well-defined and continuous surface relief profile, special methods are needed to supplement to the normal microlithography to produce those relief structures. One of the techniques is greyscale lithography, including electron and laser beam direct write and greyscale photolithography. In this paper, the development of greyscale photolithography is reviewed, in comparison with the direct write techniques. The new development in coding method for greyscale mask is introduced. The importance of correcting non linearity in optical imaging and resist development is discussed. A discussing is also devoted to practical issues in mask fabrication, thick resist patterning and pattern transfer process.

Citation Download Citation

Zheng Cui, Jinglei Du, and Yongkang Guo "Overview of grey-scale photolithography for micro-optical elements fabrication", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.477831

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