Novel electron optics for large subfield electron-beam projection lithography (EPL)

Saori Fukui; Hiroyasu Shimizu; Weiming Ren; Shohei Suzuki; Kazuya Okamoto

doi:10.1117/12.484934

16 June 2003 Novel electron optics for large subfield electron-beam projection lithography (EPL)

Saori Fukui, Hiroyasu Shimizu, Weiming Ren, Shohei Suzuki, Kazuya Okamoto

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.484934
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

In Electron-beam Projection Lithography (EPL), achieving the requirements for the ITRS 45 nm roadmap node will require decreasing simultaneously both the beam blur from the Coulomb interaction effects and the geometrical aberrations from their present values. Because next generation lithography tools are required to have both high resolution and throughput, the Coulomb effect becoems more of an issue. In this paper, we propose a novel concept to effectively decrease the Coulomb effect. Based on this new concept we develop an EPL electron optical system in which not only the Coulomb effect but also the geometrical aberrations are greatly reduced. We report on the properties of this new EPL optical system.

Citation Download Citation

Saori Fukui, Hiroyasu Shimizu, Weiming Ren, Shohei Suzuki, and Kazuya Okamoto "Novel electron optics for large subfield electron-beam projection lithography (EPL)", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484934

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Geometrical optics

Diffraction

Point spread functions

Reticles

Distortion

Projection lithography

Electron beam lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years