Application of in-situ aberration measurements to pattern-specific imaging optimization

Steve D. Slonaker; Robert J. Chung

doi:10.1117/12.485534

26 June 2003 Application of in-situ aberration measurements to pattern-specific imaging optimization

Steve D. Slonaker, Robert J. Chung

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485534
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

With the advent of in-situ aberration measurement, users may now gather a 'snapshot’ of a given lens’ aberration fingerprint following installation of the exposure tool in their fab. This paper will detail how this information may be used as input data into an optimization routine whose final output is a set of lens adjustments that will yield improved imaging performance. It will be shown that a lens with many reliable degrees of adjustment freedom can offer a wide range of optimization options. For example, for some process levels, a fixed focus latitude requirement is well defined, and it often is desirable to optimize the CD distribution over that available focus range. For other levels, there may be a strict 'image shift’ requirement over a specified focus range. In general, such optimization should include some combination of imaging performance targets. Within some limits, the user may specify the imaging performance priorities, and an optimization routine can be executed. The optimization routine may in principle allow manipulation of all available lens adjustment degrees of freedom, ending with a lens adjustment prescription that delivers the optimum result in terms of the user-specified priorities. Examples of such optimization, showing the expected improvement in the imaging performance, will be presented through image simulation results.

Citation Download Citation

Steve D. Slonaker and Robert J. Chung "Application of in-situ aberration measurements to pattern-specific imaging optimization", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485534

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available