Water immersion optical lithography for the 45-nm node

Bruce W. Smith; Hoyoung Kang; Anatoly Bourov; Frank Cropanese; Yongfa Fan

doi:10.1117/12.485489

26 June 2003 Water immersion optical lithography for 45-nm node

Bruce W. Smith, Hoyoung Kang, Anatoly Bourov, Frank Cropanese, Yongfa Fan

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485489
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

It is possible to extend optical lithography by using immersion imaging methods. Historically, the application of immersion optics to microlithography has not been seriously pursued because of the alternative solutions available. As the challenges of shorter wavelength become increasingly difficult, immersion imaging becomes more feasible. We present results from research into 193nm excimer laser immersion lithography at extreme propagation angles (such as those produces with strong OAI and PSM). This is being carried out in a fluid that is most compatible in a manufacturable process, namely water. By designing a system around the optical properties of water, we are able to image with wavelengths down to 193nm. Measured absorption is below 0.50 cm^-1at 185nm and below 0.05 cm^-1at 193nm. Furthermore, through the development of oblique angle imaging, numerical apertures approaching 1.0 in air and 1.44 in water are feasible. The refractive index of water at 193nm (1.44) allows for exploration of the following: 1. k₁ values approaching 0.17 and optical lithography approaching 35nm. 2. Polarization effects at oblique angles (extreme NA). 3. Immersion and photoresist interactions with polarization. 4. Immersion fluid composition, temperature, flow, and micro-bubble influence on optical properties (index, absorption, aberration, birefringence). 5. Mechanical requirements for imaging, scanning, and wafer transport in a water media. 6. Synthesizing conventional projection imaging via interferometric imaging.

Citation Download Citation

Bruce W. Smith, Hoyoung Kang, Anatoly Bourov, Frank Cropanese, and Yongfa Fan "Water immersion optical lithography for 45-nm node", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485489

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