Fabrication of nano-interdigitated electrodes

Luca Berdondini; Martin Kalbac; Sebastien Gautsch; Maurizio Gullo; Urs Staufer; Milena Koudelka-Hep; Nico F de Rooij

doi:10.1117/12.488975

24 April 2003 Fabrication of nano-interdigitated electrodes

Luca Berdondini, Martin Kalbac, Sebastien Gautsch, Maurizio Gullo, Urs Staufer, Milena Koudelka-Hep, Nico F de Rooij

Proceedings Volume 5116, Smart Sensors, Actuators, and MEMS; (2003) https://doi.org/10.1117/12.488975
Event: Microtechnologies for the New Millennium 2003, 2003, Maspalomas, Gran Canaria, Canary Islands, Spain

Abstract

Thin-film Pt nano interdigitated electrodes realized by combining e-beam lithography and standard photolithography are presented. The resulting nano-IDAs have an active area of 76 μm × 100 μm, an electrode pitch of 785 nm and a gap of 250 nm. The initial results show that this technology is well adapted for the realization of sub-micrometer metallic structures.

Citation Download Citation

Luca Berdondini, Martin Kalbac, Sebastien Gautsch, Maurizio Gullo, Urs Staufer, Milena Koudelka-Hep, and Nico F de Rooij "Fabrication of nano-interdigitated electrodes", Proc. SPIE 5116, Smart Sensors, Actuators, and MEMS, (24 April 2003); https://doi.org/10.1117/12.488975

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