Analog micro-optics fabrication by use of a binary phase grating mask

Jinwon Sung; Mahesh Pitchumani; Jeremiah Brown; Heidi Hockel; Eric G. Johnson

doi:10.1117/12.522221

29 December 2003 Analog micro-optics fabrication by use of a binary phase grating mask

Jinwon Sung, Mahesh Pitchumani, Jeremiah Brown, Heidi Hockel, Eric G. Johnson

Proceedings Volume 5347, Micromachining Technology for Micro-Optics and Nano-Optics II; (2003) https://doi.org/10.1117/12.522221
Event: Micromachining and Microfabrication, 2004, San Jose, California, United States

Abstract

In this paper, we present a new photo-mask technology capable of forming a continuous relief micro-optic profile on thick photo-resist. This technique eliminates many of the drawbacks of gray-scale and half-tone masking technology. An optical stepper is used to fabricate binary phase gratings of pi phase depth on a transparent quartz reticle. When the phase reticle is used in the stepper an analog intensity profile is created on the wafer. The period is constrained allowing for control of the 0^th order in the stepper. The duty cycle of the phase gratings can be varied in such a way to provide the proper analog intensity profile for a wide range of micro-optics on the photo-resist. The design, analysis, and fabrication procedures of this technique will be discussed.

Citation Download Citation

Jinwon Sung, Mahesh Pitchumani, Jeremiah Brown, Heidi Hockel, and Eric G. Johnson "Analog micro-optics fabrication by use of a binary phase grating mask", Proc. SPIE 5347, Micromachining Technology for Micro-Optics and Nano-Optics II, (29 December 2003); https://doi.org/10.1117/12.522221

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