Recent Printing And Registration Results With X-Ray Lithography

B. Fay; L. Tai; D. Alexander

doi:10.1117/12.947486

20 June 1985 Recent Printing And Registration Results With X-Ray Lithography

B. Fay, L. Tai, D. Alexander

Proceedings Volume 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV; (1985) https://doi.org/10.1117/12.947486
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

X-ray lithography has matured from a research and development phase to an implementation phase. Accordingly, the concerns have shifted from imaging issues to those of registration, critical dimension control, step height coverage, and system repeatability. In this paper, results will be discussed relating to x-ray printing and registration for full field alignment systems with 100mm field diameter using optical verniers, SEM (scanning electron microscope) and electrical wafer probe techniques. These results will encompass micrometer and submicrometer imaging using single 'level and tri-level processing techniques.

Citation Download Citation

B. Fay, L. Tai, and D. Alexander "Recent Printing And Registration Results With X-Ray Lithography", Proc. SPIE 0537, Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV, (20 June 1985); https://doi.org/10.1117/12.947486

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