Paper
28 May 2004 Production of novel materials for 157-nm and 193-nm soft pellicles
Paul A. Zimmerman, Chris van Peski, Daniel Miller, Ryan P. Callahan, Matthew Cashion
Author Affiliations +
Abstract
The introduction of 157nm lithography has raised many issues, not the least of which is the requirement of a new material for soft pellicle. At 157nm, the incident energy of 7.9 eV is enough to break any single organic bond. This makes the design of a soft pellicle material quite a challenge. Additionally, previous work in the industry has shown that improving transparency does not necessarily translate into longer pellicle lifetimes. Based on extensive investigation of how existing materials are degrading in the VUV, these new polymer systems have been produced. This study shares detailed structural information about several novel materials developed for use as soft pellicles. Additionally, data is shown for material properties including transmission and lifetime of films under 157 nm and 193 nm exposures.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paul A. Zimmerman, Chris van Peski, Daniel Miller, Ryan P. Callahan, and Matthew Cashion "Production of novel materials for 157-nm and 193-nm soft pellicles", Proc. SPIE 5377, Optical Microlithography XVII, (28 May 2004); https://doi.org/10.1117/12.534350
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KEYWORDS
Pellicles

Polymers

Transparency

Ultraviolet radiation

Fluorine

Electrons

Lithography

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