A Review Of Contrast In Positive Photoresists

Ronald W. Wake; Marie C. Flanigan

doi:10.1117/12.947845

18 April 1985 A Review Of Contrast In Positive Photoresists

Ronald W. Wake, Marie C. Flanigan

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947845
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The literature dealing with contrast in positive photoresists is reviewed. Pertinent definitions are relayed followed by a survey of the various methods proposed for the measurement of contrast. The processing techniques used to improve contrast are also enumerated along with the advantages and disadvantages of each.

Citation Download Citation

Ronald W. Wake and Marie C. Flanigan "A Review Of Contrast In Positive Photoresists", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947845

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