Paper
17 August 2004 An optical workstation for characterization and modification of MEMS
John Hedley, Jim S. Burdess, Alun J. Harris, Barry J. Gallacher, Calum J. McNeil, Peter J. Cumpson, Stefan Enderling
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Abstract
An optical workstation consisting of a surface profiler, laser vibrometer and a high power pulsed laser has been constructed for mechanical testing of MEMS. Through a series of static and dynamic measurements, the performance of a device is determined in seconds. For these measurements the device is induced to move by either using mechanical, electrostatic or optical actuation methods. In the latter case this is achieved by directing high power light pulses onto a silicon surface. The same laser can also be used to trim and frequency tune resonant devices. The workstation has been designed to incorporate single devices, wafers and packaged devices so that devices may be characterised at any stage of processing. The speed and non-contact nature of this workstation makes it suitable for industrial metrology. A variety of MEMS have been characterised, examples of which are presented. The workstation has also proved to be an invaluable tool for determining the cause of device failure in prototype designs.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Hedley, Jim S. Burdess, Alun J. Harris, Barry J. Gallacher, Calum J. McNeil, Peter J. Cumpson, and Stefan Enderling "An optical workstation for characterization and modification of MEMS", Proc. SPIE 5458, Optical Micro- and Nanometrology in Manufacturing Technology, (17 August 2004); https://doi.org/10.1117/12.545596
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Cited by 3 scholarly publications.
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KEYWORDS
Microelectromechanical systems

Laser ablation

Semiconducting wafers

Profilometers

Wafer-level optics

Objectives

Calibration

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