Compact debris-free EUV source for advanced mirror metrology

Andre Egbert; Boris Tkachenko; Stefan Becker; Boris N. Chichkov

doi:10.1117/12.554892

18 October 2004 Compact debris-free EUV source for advanced mirror metrology

Andre Egbert, Boris Tkachenko, Stefan Becker, Boris N. Chichkov

Proceedings Volume 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II; (2004) https://doi.org/10.1117/12.554892
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

A compact electron-based extreme ultraviolet (EUV) source for advanced at-wavelength mirror metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a flexible, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the EUV tube in the field of at-wavelength mirror metrology are presented.

Citation Download Citation

Andre Egbert, Boris Tkachenko, Stefan Becker, and Boris N. Chichkov "Compact debris-free EUV source for advanced mirror metrology", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.554892

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