Automatic bake plate calibration

Paul MacDonald

doi:10.1117/12.597638

6 December 2004 Automatic bake plate calibration

Paul MacDonald

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.597638
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

In this paper, we introduce MaskTemp^TM, a novel wireless metrology system to record in-situ the temperature of a reticle during processing. In combination with OnWafer Technologies' AutoCal bake plate optimization software, MaskTemp provides a quick and easy method to fingerprint and optimize the within-plate temperature uniformity of advanced PEB plates.Thermal data is collected across multiple bake plates, and we show substantial within-plate and plate-to-plate improvements in advanced multi-zone hot plates calibrated with conventional methods.

Citation Download Citation

Paul MacDonald "Automatic bake plate calibration", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.597638

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