Study of EB-tree

Kazuo Tawarayama; Shunko Magoshi; Shinji Sato; Masayuki Hatano

doi:10.1117/12.598923

6 May 2005 Study of EB-tree

Kazuo Tawarayama, Shunko Magoshi, Shinji Sato, Masayuki Hatano

Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598923
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Direct write electron-beam (e-beam) lithography, which has the maskless patterning capability and the quick turnaround for new device designs and design changes, has been applied to making the engineering samples for the development of the System on Chip products (SoC). Using the e-beam lithography to the multilevel interconnect metal was known to be evaluate in view of cost and throughput. In the case of the high-energy e-beam lithography, however, the backscattered electron from the metal caused a significant proximity effect. Authors evaluated the e-beam proximity effect using the accelerating voltage 50keV on some multi-level interconnect metal structures which consist in tungsten wiring, or Cu wiring. It was found that the backscattering range and the ratio of the backscattering energy to the incident energy depend on the thickness of metal, but also on the distance from the resist to the metal. Therefore authors propose a new method of evaluating e-beam lithography property, concept of "EB-tree". That indicates the wafer backscatter property that has heavy metal wiring using e-beam lithography. EB-tree shows the relations of wafer backscatter range and heavy metal thickness, ratio of the backscattering energy and heavy metal thickness. EB-tree could show wafer property cause of lower levels layout, understructure metal wiring, that must be taken into account when e-beam lithography.

Citation Download Citation

Kazuo Tawarayama, Shunko Magoshi, Shinji Sato, and Masayuki Hatano "Study of EB-tree", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598923

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available