Mechanical strength of resist film analyzed by tip indentation method

Osamu Tamada; Masakazu Sanada; Atsushi Ishikawa; Takayoshi Niiyama; Akira Kawai

doi:10.1117/12.599195

4 May 2005 Mechanical strength of resist film analyzed by tip indentation method

Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Takayoshi Niiyama, Akira Kawai

Proceedings Volume 5753, Advances in Resist Technology and Processing XXII; (2005) https://doi.org/10.1117/12.599195
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Mechanical strength of resist film processed by various post apply bake (PAB) conditions were measured utilizing the tip indentation method using atomic force microscope (AFM). With the tip indentation method, we could quantify mechanical strength of resist film in terms of “degree of softening.” It was found that PAB at our standard baking temperature tends to lead to softening of the resist film which is considered due to existence of softening point of the resist polymer. Also changing baking time at this temperature showed very complicated softness behavior. By control of baking temperature, we could obtain harder resist film as baking time becomes longer. Further analysis of these resist film properties by ellipsometry suggested that changes in mechanical strength occur by the evaporation of the resist solvent and/or structure changes inside the resist film, depending upon baking conditions.

Citation Download Citation

Osamu Tamada, Masakazu Sanada, Atsushi Ishikawa, Takayoshi Niiyama, and Akira Kawai "Mechanical strength of resist film analyzed by tip indentation method", Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); https://doi.org/10.1117/12.599195

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