Paper
4 May 2005 Novel negative tone photodefinable low dielectric constant hybrid films
Thomas J. Markley, Scott J. Weigel, Chris P. Kretz
Author Affiliations +
Abstract
Multifunctional films have the potential to reduce the number of processing steps to prepare various complex electronic devices and thereby reduce the cost of manufacturing the device and increase the throughput of the process. By combining low dielectric thin film and photoresist technologies into one material, such an advantage could be provided to electronics device markets. Air Products and Chemicals has discovered negative tone photodefinable films having dielectric constant values less than 3.0 that are developable in water and/or aqueous TMAH solutions. The low dielectric films produced via a novel reaction pathway involving the use of photoacid generators (PAGs) provides a versatile link to various feature sizes depending on the choice of radiation source and PAG used. Specific examples of film properties and processing latitude will be presented for these developmental materials.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas J. Markley, Scott J. Weigel, and Chris P. Kretz "Novel negative tone photodefinable low dielectric constant hybrid films", Proc. SPIE 5753, Advances in Resist Technology and Processing XXII, (4 May 2005); https://doi.org/10.1117/12.599989
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Dielectrics

Lithography

Scanning electron microscopy

Ultraviolet radiation

Polymers

Polymer thin films

Mercury

Back to Top