The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Chang-Young Jeong; Jun-Kyu Ahn; Ki-Yeop Park; Jae Sung Choi; Jeong Gun Lee

doi:10.1117/12.600418

12 May 2005 The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance

Chang-Young Jeong, Jun-Kyu Ahn, Ki-Yeop Park, Jae Sung Choi, Jeong Gun Lee

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Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600418
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

We investigated the influence of lens aberration on the lithographic performance according to the phase error and topography effects of phase-shift mask (PSM). Twin-bar and isolated pattern showing high sensitivity to lens aberration were used for this study. The simulation of aberrated images was carried out using the Solid-CTM simulator. Specially, we quantified the relationship between patterning behaviors such as the isofocal tilt, the left-right (L-R) CD difference and the Z7 and Z9 individual Zernike coefficients. Isofocal tilt aberration sensitivity for Z9 was 0.4nm/nm, which resulted in 2nm CD variation using lens with 5nm Z9 value. When using the lens with 5nm Z7 value, the L-R CD difference and its sensitivity are 10nm and 2nm/nm, respectively. Finally, we evaluated the patterning performance by phase error effect, and determined the phase error criteria for PSM. The pattern placement error was increased by increasing phase error as well as Z7 value, while its slope to the defocus was similar regardless of lens aberration. However, it was found that the aberration sensitivity was not affected by phase error. The simulation predicted that the sensitivity of lens aberration could be increased due to mask topography effect. The nominal shift of phase edge attributed to mask topography was measured.

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Chang-Young Jeong, Jun-Kyu Ahn, Ki-Yeop Park, Jae Sung Choi, and Jeong Gun Lee "The analysis of the criteria of phase error by evaluating the influence of lens aberration on the lithographic performance", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600418

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KEYWORDS

Photomasks

Critical dimension metrology

Error analysis

Lithography

Monochromatic aberrations

Optical lithography

Optical proximity correction

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