Progress in 193nm immersion lithography at IMEC

K. Ronse; G. Vandenberghe; E. Hendrickx; L. H. A. Leunissen; Y. Aksenov

doi:10.1117/12.637271

16 June 2005 Progress in 193nm immersion lithography at IMEC

K. Ronse, G. Vandenberghe, E. Hendrickx, L. H. A. Leunissen, Y. Aksenov

Proceedings Volume 5835, 21st European Mask and Lithography Conference; (2005) https://doi.org/10.1117/12.637271
Event: 21st European Mask and Lithography Conference, 2005, Dresden, Germany

Abstract

In 2004, the successful feasibility study of immersion lithography has completely pushed back the interest in 157nm lithography. Almost the complete industry has redirected its efforts and investment to 193nm immersion lithography. IMEC has announced a new lithography affiliation program on 193nm immersion technology. The program has attracted a lot of attention and a large number of companies have joined the IMEC program in the mean time. In this paper, a status update will be given on the 193nm immersion work at IMEC. Simulation and experimental results are shared and the outlook to the future of immersion lithography will be given. Special emphasis will be put on mask related issues.

Citation Download Citation

K. Ronse, G. Vandenberghe, E. Hendrickx, L. H. A. Leunissen, and Y. Aksenov "Progress in 193nm immersion lithography at IMEC", Proc. SPIE 5835, 21st European Mask and Lithography Conference, (16 June 2005); https://doi.org/10.1117/12.637271

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