Cleaning of low thermal expansion material substrates for mask blanks in EUV lithography

Sean Eichenlaub; Sebastian Dietze; Yoshiaki Ikuta; Helmut Popp; Kurt Goncher; Pat Marmillion; Abbas Rastegar

doi:10.1117/12.658508

9 November 2005 Cleaning of low thermal expansion material (LTEM) substrates for mask blanks in EUV lithography

Sean Eichenlaub, Sebastian Dietze, Yoshiaki Ikuta, Helmut Popp, Kurt Goncher, Pat Marmillion, Abbas Rastegar

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59923K (2005) https://doi.org/10.1117/12.658508
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Low thermal expansion material (LTEM) substrates were cleaned with recipes developed to clean blank quartz substrates. These recipes were capable of cleaning the LTEM without damaging the LTEM substrate. No effect of etching doped metals in LTEM was observed in these experiments. However, LTEM substrates currently require multiple cleaning cycles to obtain the same removal or cleaning efficiencies as quartz substrates. In addition, no change in the surface roughness or degradation of the backside choromium layer was observed.

Citation Download Citation

Sean Eichenlaub, Sebastian Dietze, Yoshiaki Ikuta, Helmut Popp, Kurt Goncher, Pat Marmillion, and Abbas Rastegar "Cleaning of low thermal expansion material (LTEM) substrates for mask blanks in EUV lithography", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59923K (9 November 2005); https://doi.org/10.1117/12.658508

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