A simulation-based defect disposition flow for incoming mask quality assurance

Don Lee; Brian Chu; T.Y. Fang; W.B. Shieh; Susan Hu; Jiunn-Hung Chen; Ray Morgan

doi:10.1117/12.632241

9 November 2005 A simulation-based defect disposition flow for incoming mask quality assurance

Don Lee, Brian Chu, T.Y. Fang, W.B. Shieh, Susan Hu, Jiunn-Hung Chen, Ray Morgan

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59925D (2005) https://doi.org/10.1117/12.632241
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

As the industry transitions to 90 and 65nm photolithography, the increased complexity and costs of advanced photomask remain an industry focus. Mask makers and wafer fabs must develop new techniques in photomask inspection and quality control to improve turnaround time and ultimately the mask and wafer production yield. Specific to wafer fabs, this requires an increased focus on the incoming quality control techniques combined with improved communication with the mask shop. For incoming mask inspection "mask-level" defect inspection and dispositioning is no longer adequate. Aggressive OPC on PSM masks, combined with tighter CD requirements increases the burden on both machine and operator increasing the risk of mission a killer defect. For 90nm and beyond, simulation-based defect disposition techniques will be required to predict the wafer-level printing behavior and disposition the defects appropriately. A simulation-based defect disposition flow using Synopsys's i-Virtual Stepper System (iVSS) for incoming mask quality assurance is presented in this study. This paper will examine the feasibility of implementing such a flow from a wafer-fab operation point of view. What kind of benefits can be achieved and how it works will be also presented.

Citation Download Citation

Don Lee, Brian Chu, T.Y. Fang, W.B. Shieh, Susan Hu, Jiunn-Hung Chen, and Ray Morgan "A simulation-based defect disposition flow for incoming mask quality assurance", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59925D (9 November 2005); https://doi.org/10.1117/12.632241

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available