Multi-scale soft-lithographic lift-off and grafting (MS-SLLOG) process for active polymer nanophotonic device fabrication

Yi-Chung Tung; Steven C. Truxal; Katsuo Kurabayashi

doi:10.1117/12.649044

5 December 2005 Multi-scale soft-lithographic lift-off and grafting (MS-SLLOG) process for active polymer nanophotonic device fabrication

Yi-Chung Tung, Steven C. Truxal, Katsuo Kurabayashi

Author Affiliations +

Proceedings Volume 6050, Optomechatronic Micro/Nano Devices and Components; 605002 (2005) https://doi.org/10.1117/12.649044
Event: Optomechatronic Technologies 2005, 2005, Sapporo, Japan

Abstract

This paper reports a new microfabrication process named "Multi-Scale Soft-Lithographic Lift-Off and Grafting (MS-SLLOG)" used to construct active nanophotonic devices. MS-SLLOG is a low-temperature (less than 150°C) microfabrication technique that allows soft lithographically molded polymer micro-structures to be integrated together with silicon-based microelectromechanical systems (MEMS) structures to perform active control. Moreover, MS-SLLOG process allows us to achieve a hierarchical device structure seamlessly accommodating feature sizes ranging from tens of nanometer to sub-millimeters on a single chip for nanophotonic structure integration. To demonstrate the MS-SLLOG process capability, a strain-controlled micro-optical grating device is fabricated and experimentally characterized. The experimental results successfully show the operation of an active polymer nanophotonic device fabricated by the MS-SLLOG process.

Citation Download Citation

Yi-Chung Tung, Steven C. Truxal, and Katsuo Kurabayashi "Multi-scale soft-lithographic lift-off and grafting (MS-SLLOG) process for active polymer nanophotonic device fabrication", Proc. SPIE 6050, Optomechatronic Micro/Nano Devices and Components, 605002 (5 December 2005); https://doi.org/10.1117/12.649044

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