Residual layer-free detachment-based nanolithography

Jae Kwan Kim; Jee Won Park; Hongjoo Yang; Mansoo Choi; Joon Ho Choi; Kahp Yang Suh

doi:10.1117/12.682144

24 March 2006 Residual layer-free detachment-based nanolithography

Jae Kwan Kim, Jee Won Park, Hongjoo Yang, Mansoo Choi, Joon Ho Choi, Kahp Yang Suh

Proceedings Volume 6151, Emerging Lithographic Technologies X; 61512O (2006) https://doi.org/10.1117/12.682144
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

We present a simple method to generate nanostructures without residual layer using detachment-based nanolithography. Spin coated organic thin film and patterned stamp such as ultraviolet (UV) curable mold were prepared. The mold and organic thin film were contacted by slight pressure (1~2 bar). While conformal contact between mold and organic thin film, the sample was heated under the glass transient temperature. After cooling to room temperature, the mold was removed from substrate, rendering a pattern organic layer without residual layer. This method can form as small as 70 nm lines.

Citation Download Citation

Jae Kwan Kim, Jee Won Park, Hongjoo Yang, Mansoo Choi, Joon Ho Choi, and Kahp Yang Suh "Residual layer-free detachment-based nanolithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 61512O (24 March 2006); https://doi.org/10.1117/12.682144

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