EUV generation from lithium laser plasma for lithography

Simi A. George; William Silfvast; Kazutoshi Takenoshita; Robert Bernath; Chiew-Seng Koay; Greg Shimkaveg; Martin Richardson; Moza Al-Rabban; Howard Scott

doi:10.1117/12.660584

24 March 2006 EUV generation from lithium laser plasma for lithography

Simi A. George, William Silfvast, Kazutoshi Takenoshita, Robert Bernath, Chiew-Seng Koay, Greg Shimkaveg, Martin Richardson, Moza Al-Rabban, Howard Scott

Author Affiliations +

Proceedings Volume 6151, Emerging Lithographic Technologies X; 615143 (2006) https://doi.org/10.1117/12.660584
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Hydrogen-like line emission from lithium has long been considered a candidate for EUV light source for lithography. We have completed the evaluation of the potential of lithium as a laser-plasma source, both theoretically and experimentally. Theoretical calculations show optimum intensity region for lithium for attaining high conversion is close to 5.0 x 10¹¹ W/cm², with plasma temperature near 50 eV. Experimental studies compare directly, the conversion efficiency and optimum irradiation conditions for both planar tin and lithium solid targets. Best conversion efficiency found in this study is 2% for lithium, while CE measured is better than 4% for tin target at identical experimental conditions.

Citation Download Citation

Simi A. George, William Silfvast, Kazutoshi Takenoshita, Robert Bernath, Chiew-Seng Koay, Greg Shimkaveg, Martin Richardson, Moza Al-Rabban, and Howard Scott "EUV generation from lithium laser plasma for lithography", Proc. SPIE 6151, Emerging Lithographic Technologies X, 615143 (24 March 2006); https://doi.org/10.1117/12.660584

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