Benchmark comparison of multiple process control strategies for lithographic CD control

Wei Kang; John Mao

doi:10.1117/12.656684

24 March 2006 Benchmark comparison of multiple process control strategies for lithographic CD control

Wei Kang, John Mao

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61520E (2006) https://doi.org/10.1117/12.656684
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

In this paper, we present a study on the robustness comparison of several process feedbacks controllers. The feedbacks include those based on either EWMA or Kalman Filter estimation. In addition, a new multiple dimension feedback controller is introduced, which has a significantly improved robust stability and reduced sensitivity to unknown noise. In the robustness study, we assume model mismatch and unknown disturbances. Two issues of robustness are addressed in this paper, namely the region of model mismatch in which a process feedback is stable; and the H-infinity gain of the controlled process from unknown noise to the system performance. Simulations are shown to compare the performance of the feedbacks under model mismatch, system drifting, and random noise.

Citation Download Citation

Wei Kang and John Mao "Benchmark comparison of multiple process control strategies for lithographic CD control", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61520E (24 March 2006); https://doi.org/10.1117/12.656684

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