High-resistance W-plug monitoring with an advance e-beam inspection system

Hermes Liu; J. H. Yeh; Chan Lon Yang; S. C. Lei; J. Y. Kao; Y. D. Yang; Mingsheng Tsai; S. F. Tzou; Wei-Yih Wu; Hong-Chi Wu; Hong Xiao; Jack Jau

doi:10.1117/12.656217

24 March 2006 High-resistance W-plug monitoring with an advance e-beam inspection system

Hermes Liu, J. H. Yeh, Chan Lon Yang, S. C. Lei, J. Y. Kao, Y. D. Yang, Mingsheng Tsai, S. F. Tzou, Wei-Yih Wu, Hong-Chi Wu, Hong Xiao, Jack Jau

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61524A (2006) https://doi.org/10.1117/12.656217
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Dark voltage contrast (DVC) defects are detected on normally bright tungsten plugs (W-plugs) during the in-line e-beam inspection step. Cross-sectional scanning electron microscope (SEM) and transmission electron microscope (TEM) in a failure analysis (FA) lab verified that DVC defects with different gray level values (GLV) are caused by different resistances of the W-plugs. We found that DVC defects with lower GLV (GLV1) are W-plugs that are open or almost open. DVC defects with higher GLV GLV2 are caused by partially open W-plugs and in-plug voids. Wafer acceptance test (WAT) results correlated well with e-beam inspection results.

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Hermes Liu, J. H. Yeh, Chan Lon Yang, S. C. Lei, J. Y. Kao, Y. D. Yang, Mingsheng Tsai, S. F. Tzou, Wei-Yih Wu, Hong-Chi Wu, Hong Xiao, and Jack Jau "High-resistance W-plug monitoring with an advance e-beam inspection system", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61524A (24 March 2006); https://doi.org/10.1117/12.656217

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