Two-layer anti-reflection strategies for implant applications

Douglas J. Guerrero; Tamara Smith; Masakazu Kato; Shigeo Kimura; Tomoyuki Enomoto

doi:10.1117/12.656528

11 April 2006 Two-layer anti-reflection strategies for implant applications

Douglas J. Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, Tomoyuki Enomoto

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61530O (2006) https://doi.org/10.1117/12.656528
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

A two-layer bottom anti-reflective coating (BARC) concept in which a layer that develops slowly is coated on top of a bottom layer that develops more rapidly was demonstrated. Development rate control was achieved by selection of crosslinker amount and BARC curing conditions. A single-layer BARC was compared with the two-layer BARC concept. The single-layer BARC does not clear out of 200-nm deep vias. When the slower developing single-layer BARC was coated on top of the faster developing layer, the vias were cleared. Lithographic evaluation of the two-layer BARC concept shows the same resolution advantages as the single-layer system. Planarization properties of a two-layer BARC system are better than for a single-layer system, when comparing the same total nominal thicknesses.

Citation Download Citation

Douglas J. Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, and Tomoyuki Enomoto "Two-layer anti-reflection strategies for implant applications", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61530O (11 April 2006); https://doi.org/10.1117/12.656528

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