Study of mask induced polarization effects on att.PSM in immersion lithography

Takashi Mizoguchi; Yousuke Kojima; Mikio Takagi; Tadashi Saga; Takashi Haraguchi; Toshio Konishi; Yuuichi Fukushima; Tsuyoshi Tanaka; Yoshimitsu Okuda

doi:10.1117/12.681878

19 May 2006 Study of mask induced polarization effects on att.PSM in immersion lithography

Takashi Mizoguchi, Yousuke Kojima, Mikio Takagi, Tadashi Saga, Takashi Haraguchi, Toshio Konishi, Yuuichi Fukushima, Tsuyoshi Tanaka, Yoshimitsu Okuda

Author Affiliations +

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62831E (2006) https://doi.org/10.1117/12.681878
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

The immersion lithography for 45 nm generation has been developing aggressively for smaller critical dimension of semiconductor devices. The polarization lithography system is indispensable to have an advantage to use the immersion lithography with hyper NA (>1.0). As pattern size becomes smaller, mask induced polarization effects to polarization of exposure image seems not to be negligible. There are several issues about mask induced polarization. But dominant factor for mask induced polarization effect is not understood well. In this paper, in case of monolayer mask of att.PSM, degree of polarization (DoP) strongly depends on film thickness and extinction coefficient from simulation and experimental results. DoP depends on material factor. And in case of double layer mask, DoP depends on total film thickness and extinction coefficient of both upper layer and bottom layer. So, DoP depends also on structure of mask.

Citation Download Citation

Takashi Mizoguchi, Yousuke Kojima, Mikio Takagi, Tadashi Saga, Takashi Haraguchi, Toshio Konishi, Yuuichi Fukushima, Tsuyoshi Tanaka, and Yoshimitsu Okuda "Study of mask induced polarization effects on att.PSM in immersion lithography", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831E (19 May 2006); https://doi.org/10.1117/12.681878

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Nanoimprint lithography

Photomasks

Polarization

Refractive index

Immersion lithography

Mass attenuation coefficient

Lithographic illumination

Show All Keywords

Keywords/Phrases

Search In:

Publication Years