Dynamic shadow mask technique for device fabrication in UHV

Stefan Egger

doi:10.1117/12.681375

8 September 2006 Dynamic shadow mask technique for device fabrication in UHV

Stefan Egger

Proceedings Volume 6340, Solar Hydrogen and Nanotechnology; 63400Z (2006) https://doi.org/10.1117/12.681375
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Clean structures are fabricated in ultrahigh vacuum conditions by evaporation through a shadow mask, avoiding contamination by resist, chemicals or exposure to air. Moving the shadow mask with nanometer precision during the growth of the structures gives additional freedom in determining the lateral shape and the thickness profile. Different materials can easily be combined and chosen from a large range of metals, semiconductors or insulators. In-situ treated surfaces or, conversely, ex-situ pre-fabricated samples can be used as substrates.

Citation Download Citation

Stefan Egger "Dynamic shadow mask technique for device fabrication in UHV", Proc. SPIE 6340, Solar Hydrogen and Nanotechnology, 63400Z (8 September 2006); https://doi.org/10.1117/12.681375

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