Laser-produced EUV light source development for HVM

Akira Endo; Hideo Hoshino; Takashi Suganuma; Masato Moriya; Tatsuya Ariga; Yoshifumi Ueno; Masaki Nakano; Takeshi Asayama; Tamotsu Abe; Hiroshi Komori; Georg Soumagne; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda

doi:10.1117/12.711097

19 March 2007 Laser produced EUV light source development for HVM

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, Koichi Toyoda

Author Affiliations +

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65170O (2007) https://doi.org/10.1117/12.711097
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We develop a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a short pulse, high power, high repetition rate CO₂ master oscillator power amplifier (MOPA) laser system and a Tin droplet target. A maximum conversion efficiency of 4.5% was measured for a CO₂ laser driven Sn plasma having a narrow spectrum at 13.5 nm. In addition, low debris generation was observed. The CO₂ MOPA laser system is based on commercial high power cw CO₂ lasers. We achieve an average laser power of 3 kW at 100 kHz with a single laser beam that has very good beam quality. In a first step, a 50-W light source is developing. Based on a 10-kW CO₂ laser this light source is scalable to more than 100 W EUV in-band power.

Citation Download Citation

Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani, and Koichi Toyoda "Laser produced EUV light source development for HVM", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170O (19 March 2007); https://doi.org/10.1117/12.711097

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