Development of EUV mask handling technology at MIRAI-Selete

Kazuya Ota; Mitsuaki Amemiya; Takao Taguchi; Takashi Kamono; Hiroyoshi Kubo; Tadahiko Takikawa; Yoichi Usui; Osamu Suga

doi:10.1117/12.711317

20 March 2007 Development of EUV mask handling technology at MIRAI-Selete

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Takashi Kamono, Hiroyoshi Kubo, Tadahiko Takikawa, Yoichi Usui, Osamu Suga

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171Z (2007) https://doi.org/10.1117/12.711317
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We, MIRAI-Selete, started a new EUV mask program in April, 2006. Development of EUV mask handling technology is one of the key areas of the program. We plan to develop mask handling technology and to evaluate EUV mask carriers using Lasertec M3350, a particle inspection tool with the defect sensitivity less than 50nm PSL, and Mask Protection Engineering Tool (named "MPE Tool"). M3350 is a newly developed tool based on a conventional M1350 for EUV blanks inspection. Since our M3350 has a blank flipping mechanism in it, we can inspect the front and the back surface of the blank automatically. We plan to use the M3350 for evaluating particle adders during mask shipping, storage and handling. MPE Tool is a special tool exclusively developed for demonstration of pellicleless mask handling. It can handle a mask within a protective enclosure, which Canon and Nikon have been jointly proposing1, and also, can be modified to handle other type of carrier as the need arises.

Citation Download Citation

Kazuya Ota, Mitsuaki Amemiya, Takao Taguchi, Takashi Kamono, Hiroyoshi Kubo, Tadahiko Takikawa, Yoichi Usui, and Osamu Suga "Development of EUV mask handling technology at MIRAI-Selete", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171Z (20 March 2007); https://doi.org/10.1117/12.711317

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