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The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues:
*Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR.
*Advantages in the development of a complete set of the special process equipment;
Without taking into account technical and chemical processes, this complete set includes three component parts:
*Multi-beam laser pattern generator;
*Die-to-Database reticle inspection system;
*Laser reticle repair system.
Syarhei Avakaw,Valerian Iouditski,Leanid Pushkin, andAlena Tsitko
"A complete set of the special process equipment for the defect-free production of reticles", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331B (3 May 2007); https://doi.org/10.1117/12.736525
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Syarhei Avakaw, Valerian Iouditski, Leanid Pushkin, Alena Tsitko, "A complete set of the special process equipment for the defect-free production of reticles," Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331B (3 May 2007); https://doi.org/10.1117/12.736525