Length calibration standards for nano-manufacturing

David C. Joy; Sachin Deo; Brendan J. Griffin

doi:10.1117/12.735576

10 September 2007 Length calibration standards for nano-manufacturing

David C. Joy, Sachin Deo, Brendan J. Griffin

Proceedings Volume 6648, Instrumentation, Metrology, and Standards for Nanomanufacturing; 664807 (2007) https://doi.org/10.1117/12.735576
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

The physical dimensions of nanoscale objects are an important indicator of their functionality. However, measuring feature size from a SEM image is difficult not only because of fundamental considerations, such as the nature of beam interactions and the information transfer properties of the microscope, but because the magnification of the SEM image from which a measurement will be made is completely uncalibrated and additionally is subject to local distortions and variations. Nano-gauges fabricated by electron beam lithography - one or two dimensional structures on the size scale of the objects of interest - provide a local length standards within the image field from which the relative size of features can be accurately determined. In order to provide an absolute measurement of size the dimensions of the nano-gauge structure must themselves be calibrated against some primary standard. Because there are no convenient standards of appropriate scale available we propose that this can be done using a moiré fringe technique to bridge the gap between the nanoscale and common length standards such as ruled diffraction gratings.

Citation Download Citation

David C. Joy, Sachin Deo, and Brendan J. Griffin "Length calibration standards for nano-manufacturing", Proc. SPIE 6648, Instrumentation, Metrology, and Standards for Nanomanufacturing, 664807 (10 September 2007); https://doi.org/10.1117/12.735576

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KEYWORDS

Scanning electron microscopy

Calibration

Metrology

Electron beam lithography

Semiconducting wafers

Diffraction gratings

Electron beams

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