Determination of optical constants of zirconia and silica thin films in UV to visible range

Weihua Jin; Chunshui Jin; Hongli Zhu; Lei Liu; Huaijiang Yang

doi:10.1117/12.782900

14 November 2007 Determination of optical constants of zirconia and silica thin films in UV to visible range

Weihua Jin, Chunshui Jin, Hongli Zhu, Lei Liu, Huaijiang Yang

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67220T (2007) https://doi.org/10.1117/12.782900
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

A curve fitting method for determining the optical constants of some dielectric thin films is described with dispersion theory in the paper. A computer program based on Matlab is developed and optimized. The fitting errors are analyzed with theoretical data, which gives very high accurate results. A program is applied to fitting the measured photometric spectra of ion sputtered zirconia and silica thin films in 200-850nm spectra range. The thickness is verified with the method of grazing x-ray diffraction. With the thickness known, the optical constants of zirconia films near the absorption range are obtained with single-wavelength method. As a result, quite good fitting results are obtained with high accuracy. Finally, an ultraviolet (UV) high-pass optical filter is designed with optical constants extracted by this method. The transmission and reflection spectra of the filter are measured and compared to designed spectra. A good coherence was derived.

Citation Download Citation

Weihua Jin, Chunshui Jin, Hongli Zhu, Lei Liu, and Huaijiang Yang "Determination of optical constants of zirconia and silica thin films in UV to visible range", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67220T (14 November 2007); https://doi.org/10.1117/12.782900

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