Numerical and experimental study on SU-8 UV photolithography

Liqun Du; Shenmiao Zhu; Jiang Qin; Chong Liu

doi:10.1117/12.783364

14 November 2007 Numerical and experimental study on SU-8 UV photolithography

Liqun Du, Shenmiao Zhu, Jiang Qin, Chong Liu

Proceedings Volume 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 67222T (2007) https://doi.org/10.1117/12.783364
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

In this paper, the dimensional precision and tolerance of SU-8 photoresist microstructures are investigated quantitatively. An UV exposure improved model and a dimensional tolerance model based on Fresnel diffraction theory are established by considering the impact of the refractive index and absorption coefficient of SU-8 photoresist on dimensional precision of UV-photolithography. These models can be used to predict the dimension and tolerance of SU-8 photoresist microchannels, and the variation between the dimensional tolerance and the photolithographic parameters. The dimension and tolerance of SU-8 photoresist microstructure are simulated by MATLAB. Based on the UV exposure model, a simple development model was established by swelling theory, which can be used to predict the swelling trend of SU-8 photoresist during developing process. By this development model, the dimension change of SU-8 photoresist due to swelling in developing process has been researched quantitatively.

Citation Download Citation

Liqun Du, Shenmiao Zhu, Jiang Qin, and Chong Liu "Numerical and experimental study on SU-8 UV photolithography", Proc. SPIE 6722, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 67222T (14 November 2007); https://doi.org/10.1117/12.783364

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KEYWORDS

Photoresist materials

Tolerancing

Photoresist developing

Ultraviolet radiation

Near field diffraction

Absorption

Photomasks

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