CD bias control with in-situ plasma treatment in EPSM photomask etch

Karmen Yung; Chang-Ju Choi; Ki-Ho Baik

doi:10.1117/12.746772

30 October 2007 CD bias control with in-situ plasma treatment in EPSM photomask etch

Karmen Yung, Chang-Ju Choi, Ki-Ho Baik

Proceedings Volume 6730, Photomask Technology 2007; 67300A (2007) https://doi.org/10.1117/12.746772
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

As mask feature size decreases, etch bias control during Cr and shifter etch becomes more critical factor in Embedded Phase Shifter Mask (EPSM) mask making processes. Since the etching characteristics of the shifter materials, Molybdenum Silicide (MoSi), are sensitive to etching surface condition, Critical Dimension (CD) performance of the shifter layer strongly depends on incoming surface condition from Cr etch. In this paper, lateral etch component of MoSi etch was investigated as a function of various substrate conditions so that a new in-situ plasma treatment was suggested to control the CD bias during MoSi etch. The CD performance was characterized within the surface treatment plasmas and also correlated with some plasma parameters and substrate temperature. As a result, it was found that plasma surface modification could be an in-situ technique to better control the shifter CD in EPSM process and an essential option for redundancy tools in mask production environment.

Citation Download Citation

Karmen Yung, Chang-Ju Choi, and Ki-Ho Baik "CD bias control with in-situ plasma treatment in EPSM photomask etch", Proc. SPIE 6730, Photomask Technology 2007, 67300A (30 October 2007); https://doi.org/10.1117/12.746772

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available