DPL performance analysis strategy with conventional workflow

Nobuhito Toyama; Yuichi Inazuki; Takanori Sutou; Takaharu Nagai; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi; Junji Miyazaki; Alek Chen; Nandasiri Samarakone

doi:10.1117/12.747380

30 October 2007 DPL performance analysis strategy with conventional workflow

Nobuhito Toyama, Yuichi Inazuki, Takanori Sutou, Takaharu Nagai, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi, Junji Miyazaki, Alek Chen, Nandasiri Samarakone

Author Affiliations +

Proceedings Volume 6730, Photomask Technology 2007; 67301I (2007) https://doi.org/10.1117/12.747380
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

DPL (Double Patterning Lithography) has been in public as one of candidates for 45nm or 32nm HP since ITRS2006update disclosed. A lot of report of the performances and issues regarding to DPL were published. The current main concerns are evaluation of the infrastructures such as decomposition software, advanced photomasks, higher-NA exposure tool and leading-edge hard-mask process. If there is simpler procedure to evaluate DPL using a conventional environment without hard-mask process, the development of DPL will be accelerated. Here, the simple evaluation procedure for DPL using actual photomasks combining double exposure technique was proposed. The pseudo DPL result in terms of mask CD uniformity, image placement and overlay were demonstrated. In this evaluation procedure, decomposition restriction, mask latitude and fabrication load were also discussed

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Nobuhito Toyama, Yuichi Inazuki, Takanori Sutou, Takaharu Nagai, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi, Junji Miyazaki, Alek Chen, and Nandasiri Samarakone "DPL performance analysis strategy with conventional workflow", Proc. SPIE 6730, Photomask Technology 2007, 67301I (30 October 2007); https://doi.org/10.1117/12.747380

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