New approach for antireflective fused silica surfaces by statistical nanostructures

M. Schulze; H.-J. Fuchs; E.-B. Kley; A. Tünnermann

doi:10.1117/12.767778

6 February 2008 New approach for antireflective fused silica surfaces by statistical nanostructures

M. Schulze, H.-J. Fuchs, E.-B. Kley, A. Tünnermann

Proceedings Volume 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics; 68830N (2008) https://doi.org/10.1117/12.767778
Event: MOEMS-MEMS 2008 Micro and Nanofabrication, 2008, San Jose, California, United States

Abstract

In this work we present a new technique in order to create antireflective surfaces with the help of statistical nanostructures on fused silica. A specific plasma etching process was found to serve this purpose, as thereby nanostructures are created through self-masking. Under specific etching conditions the micro-contaminations create pillars on the surface with dimensions down to 20 nm, which act as an antireflective nanostructure. Those structures raise the transmission of fused silica in the wavelength range from 370 nm to 500 nm to more than 99.5% (both sides etched). Within the close UV range (from 200 nm up to 400 nm) the transmission can be raised by 4.8% to 97.1% on average.

Citation Download Citation

M. Schulze, H.-J. Fuchs, E.-B. Kley, and A. Tünnermann "New approach for antireflective fused silica surfaces by statistical nanostructures", Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830N (6 February 2008); https://doi.org/10.1117/12.767778

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