Smoothing properties of single and multilayer coatings: a method to smoothen substrates

A. J. R. van den Boogaard; E. Louis; E. Zoethout; S. Alonso van der Westen; F. Bijkerk; S. Müllender

doi:10.1117/12.772479

26 March 2008 Smoothing properties of single and multilayer coatings: a method to smoothen substrates

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Alonso van der Westen, F. Bijkerk, S. Müllender

Proceedings Volume 6921, Emerging Lithographic Technologies XII; 69210R (2008) https://doi.org/10.1117/12.772479
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

In this work we present the smoothing properties of our ion beam smoothened multilayers and, based on the same technology, the extreme smoothing properties in the high and near mid spatial frequency range of a single-material smoothing layer. Coating results of high reflectance multilayers both on rough substrates and on substrates smoothened with silicon bufferlayers are discussed.

Citation Download Citation

A. J. R. van den Boogaard, E. Louis, E. Zoethout, S. Alonso van der Westen, F. Bijkerk, and S. Müllender "Smoothing properties of single and multilayer coatings: a method to smoothen substrates", Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210R (26 March 2008); https://doi.org/10.1117/12.772479

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